Transparent and Reusable Nanostencil Lithography for Organic–Inorganic Hybrid Perovskite Nanodevices (Adv. Funct. Mater. 29/2023)

Ice lithography for nanodevices.

We report the successful application of a new approach, ice lithography (IL), to fabricate nanoscale devices. The entire IL process takes place inside a modified scanning electron microscope (SEM), where a vapor-deposited film of water ice serves as a resist for e-beam lithography, greatly simplifying and streamlining device fabrication. We show that labile nanostructures such as carbon nanotub...

Materials and Wireless Microfluidic Systems for Electronics Capable of Chemical Dissolution on Demand (Adv. Funct. Mater. 92015)

Nanostencil lithography for high-throughput fabrication of infrared plasmonic sensors

We demonstrate a novel fabrication approach for high-throughput fabrication of engineered infrared plasmonic nanorod antenna arrays with Nanostencil Lithography (NSL). NSL technique, relying on deposition of materials through a shadow mask, offers the flexibility and the resolution to fabricate radiatively engineer nanoantenna arrays for excitation of collective plasmonic resonances. Overlappin...

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm resolution even for 40-nm thick structures by using a sacrificial layer to control the proximity...

Metamaterials: Snapping Mechanical Metamaterials under Tension (Adv. Mater. 39/2015).

By exploiting snap-through instabilities, D. Pasini and co-workers design a damage-tolerant mechanical metamaterial that snaps sequentially under tension, thereby accommodating a very large deformation up to 150%. On page 5931, they describe how the nonlinear mechanical response of the metamaterial can be robustly programmed by tuning the architecture of its unit cell.